VFC301

FOUP and FOSB cleaner

The world’s only dedicated FOUP body and FOUP cover cleaner

VFC301 – The most technologically advanced worldwide FOUP and fosb cleaner

Discover the VFC301, a cutting-edge cleaning solution developed by Innovative System Technology, specifically designed for the semiconductor manufacturing industry. With its unique dual-chamber system, the VFC301 allows for the simultaneous cleaning of FOUP Bodies and Covers, optimizing operational efficiency and significantly reducing cycle times.

World’s N°1 for <30nm IC fabs and wafer/substrate manufacturers

The VFC301 is engineered to meet the stringent demands of the semiconductor industry, fully compatible with almost 100% of FOUP and FOSB brands, combining advanced technology, reliability and efficiency to enhance productivity while maintaining strict quality standards.
The world’s only separate cleaners of FOUP/FOSB body and FOUP/FOSB cover

Short delivery
time

6 month delivery
(4 months manufacturing included)

2 years
warranty

Minimum, from installation
date at your site

Historical
partnership

Samsung, HYNIX, SK Siltron
and more !

Friendly user
interface

Fast engineering
for software customization

impressive
reliability

Average of
4 alarms per year

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Vacuum dryer system (3set)

Remove outgassing and impurities •
Moisture reduction •
3 chamber •

Loader/unloader

N2 purge •
Leak check •
<5% humidity check •
Wafer presence sensor •

Tilt unit

FOUP transfer •
FOUP cover separation •

Loader/unloader

N2 purge •
Leak check •
<5% humidity check •
Wafer presence sensor •

Loader/unloader

N2 purge •
Leak check •
<5% humidity check •
Wafer presence sensor •

Clean chamber unit

• Body and cover cleaning & drying
• 3 unit / chambers
• Hot & cold cleaning method

FOUP Transfer robot

• FOUP and cover transfer
• 6 Axis
• 20kg payload

boost your efficiency with the vfc301

key Features:
  • High Productivity: The VFC301 can process up to 20 FOUPs per hour, ensuring maximum productivity in your manufacturing processes.
  • Humidity Control: Maintains humidity levels below 5%, crucial for protecting sensitive semiconductor components.
  • Advanced Cleaning Method: Achieving very low particle count by cleaning body and cover separatly. Utilizes hot and cold deionized water (DIW) to effectively remove particles, achieving a particle count of ≤ 200 (0.1 µm).
  • Advanced in-FOUP wafer detection to prevent wafer scrap
Benefits and Features:
  • Nâ‚‚ Purge and Leak Check System: This system ensures the integrity of the cleaning process by purging the environment and checking for leaks, maintaining a contamination-free environment.
  • Compact and Optimized Design: The VFC301‘s layout is specifically designed for space efficiency, fitting seamlessly into various manufacturing environments without compromising performance.
  • Superior vacuum dryer to reach very low residual humidity and outgazing impurities
  • Full AMHS compatibility
Unmatched Reliability:
  • Mean Time Between Failures (MTBF): Greater than 1,500 hours, providing high reliability and fewer unexpected downtimes.
  • Mean Time to Repair (MTTR): Less than 4 hours, enabling a quick recovery from operational issues.
  • Alarm Frequency: An average of 0.31 alarms per month, reflecting consistent performance with minimal disruptions.
  • Unmatched reliability : very low maintenance and cost of ownership (<2h every 6 months)

the system for your needs

NFC300

The world's only FOUP and FOSB cleaner with body and cover separation, avoiding cross contamination

Specifications

ItemNFC300
Uptime> 98%
Technology node< 30nm
Throughput (/Hour)18
Dimensions (WxDxH, mm)2.140 x 3.290 x 3.215
Number of clean chambersBody 2 chambers / Cover 2 chambers
Vacuum chambersNo
Vacuum pumpNo
N2 Purge quantity  1
Halogen heater lampNo
Humidity control< 20%
FOUP leak testerNo
Loader / unloader2 Loader / 1 Unloader
Tilt & Opener3
RobotFour-axis robot
Hot D.I UnitOptionnal
Controller & Monitor1
FFU4
CCD camera3
Ionize2
SEMI StandardsSEMI E87/E94/E40
Host customer communicationGEM300
OSEnglish Windows 10

VFC301

The world's only FOUP and FOSB cleaner with body and cover separation, avoiding cross contamination

Specifications

ItemVFC301
Uptime> 98%
Technology node< 10nm
Throughput (/Hour)20
Dimensions (WxDxH, mm)2.140 x 3.290 x 3.215
Number of clean chambersBody 2 chambers / Cover 2 chambers
Vacuum chambersYes (2)
Vacuum pumpYes (2)
N2 Purge quantity  3
Halogen heater lampYes
Humidity control< 5%
FOUP leak testerYes (3)
Loader / unloader2 Loader / 1 Unloader
Tilt & Opener3
RobotFour-axis robot
Hot D.I UnitOptionnal
Controller & Monitor1
FFU4
CCD camera3
Ionize2
SEMI StandardsSEMI E87/E94/E40
Host customer communicationGEM300
OSEnglish Windows 10

VFC310

VFC310 - ISTE - FOUP and FOSB cleaner

Specifications

ItemVFC310
Uptime> 98%
Technology node< 10nm
Throughput (/Hour)30
Dimensions (WxDxH, mm)3.000 x 4.800 x 3.120
Number of clean chambersBody 3 chambers / Cover 3 chambers
Vacuum chambersYes (3)
Vacuum pumpYes (3)
N2 Purge quantity  4
Halogen heater lampY
Humidity control< 5%
FOUP leak testerYes
Loader / unloader2 Loader / 2 Unloader
Tilt & Opener4
RobotSix-axis multi-joint robot
Hot D.I UnitOptionnal
Controller & Monitor1
FFU8
CCD camera3
Ionize2
SEMI StandardsSEMI E87/E94/E40
Host customer communicationGEM300
OSEnglish Windows 10
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